Please use this identifier to cite or link to this item:
http://dspace.cus.ac.in/jspui/handle/1/6373| Title: | Effects of ion irradiation on the structural and electrical properties of HfO <inf>2</inf> /SiON/Si p-metal oxide semiconductor capacitors |
| Authors: | Manikanthababu, N. Saikiran, V. Basu, T. Prajna, K. Vajandar, S. Pathak, A.P. Panigrahi, B.K. Osipowicz, T. Rao, S.V.S.N. |
| Issue Date: | 2019 |
| Citation: | Thin Solid Films 682 2019 |
| URI: | http://dspace.cus.ac.in/jspui/handle/1/6373 |
| ISSN: | 406090 |
| Appears in Collections: | Publication indexed in Scopus |
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