Please use this identifier to cite or link to this item:
http://dspace.cus.ac.in/jspui/handle/1/6792| Title: | Effects of ion irradiation on the structural and electrical properties of HfO2/SiON/Si p-metal oxide semiconductor capacitors |
| Authors: | Manikanthababu, N Saikiran, V Basu, T Prajna, K Vajandar, S Pathak, A. P Panigrahi, B. K Osipowicz, T. Rao, S. V. S. Nageswara |
| Issue Date: | 31-Jul-2019 |
| Citation: | Thin Solid Films 682, 2019: 156-162 |
| URI: | http://dspace.cus.ac.in/jspui/handle/1/6792 |
| Appears in Collections: | Publication indexed in Web of Science |
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